QDGF-F30

QDGF-F30

SiO₂≥99.85%, D50=29.5 μm, produced by fusion technology. Low thermal expansion and low dielectric loss with excellent powder flowability. Mostly applied for refractory materials, electronic packaging and composite filling.

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  • CCL filler
  • EMC electronic packaging
  • High‑grade refractory materials
  • Optics and aviation components
  • Electronics & chemical composite materials